Alternative approach for the growth of a TiB2/TiC multilayer on M2 steel using the duplex method: Cathodic arc physical vapor deposition and cathodic reduction and thermal diffusion boriding

An alternative approach for producing a hard TiB2/TiC multilayer on M2 high-speed steel was introduced by combining cathodic arc physical vapor deposition (CA-PVD) and reduction thermal diffusion-based boriding (CRTD-Bor). In this regard, the CRTD-Bor process applied CA-PVD Ti-deposited effects of parameters (i.e., temperatures durations) growth were examined. During boriding, Ti coating substrate converted into Ti-borides top surface TiC layer simultaneously formed at interface deposit matrix. The boride carbide phases found to obey parabolic law. pre-exponential factors (K0) activation energy (Q) values calculated as 7.50 × 10−9 m2/s 146.10 kJ/mol TiB2 1.81 10−7 187.31 formations, respectively. Additionally, empirical equations estimating thicknesses layers derived. penetration depth-dependent hardness measurements revealed 41 ± 5 Gpa, which decreased gradually toward TiB region (24 2 GPa) fell 13 1 GPa in Ti-rich area. then increased 20 with contribution adjacent substrate. This exhibited −5.5 −4.5 compressive stress good adhesions (HF1) substrates. Also, results tribological tests indicated sevenfold increase wear resistance under dry sliding conditions.